An implant of acceptor ions into either a p- or n-type substrate will shift the threshold voltage to more positive values, while an implant of donor ions will shift the threshold voltage to more negative values.( )
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The narrow-channel and short-channel devices both produce a smaller threshold voltage in n-channel MOSFETs.( )
The channel length modulation, velocity saturation and ballistic transport are more likely to occur in short-channel MOSFET devices.( )
The effective inversion charge mobility is dependent of the electric field at the inversion layer and temperature.( )
The surface scattering effect increases the electron mobility in the inversion layer in n channel MOSFET.( )